文献类型：期刊文章

作　　者：谭天伟[1] 贺小进[1] 杜卫霞[1]

机构地区：[1]北京化工大学生物化工系,北京100029

出　　处：《化工学报》

基　　金：国家自然科学基金资助项目!(No .2 9976 0 0 4);霍英东优秀青年教师基金支持项目!(No .710 16 )

年　　份：2001

卷　　号：52

期　　号：2

起止页码：176-178

语　　种：中文

收录情况：AJ、BDHX、BDHX2000、CAS、CSCD、CSCD2011_2012、EI、IC、JST、RCCSE、SCOPUS、ZGKJHX、核心刊

摘　　要：Adsorption model of metal ion on imprinting chitosan resin was studied. The chemical and the physical properties such as pore size distribution and heat stability were discussed and the imprinting chitosan resin can be used many times without losing adsorption capacity. The adsorption isotherms and adsorption mechanism were studied and a new model was suggested to correlate relation of adsorption with pH and metal ion concentration,which could explain mechanism of adsorption.

关 键 词：壳聚糖 分子印迹 金属离子印迹树脂  吸附模型  

分 类 号：TQ028.15] O647.3]